The
formation of the wire grid with closed loops is completed by the constriction of this perforated film into thin wires with anchor points on the unaffected film pads on the substrate. Depending on the specific selleck irradiation pattern and the resulting positions of film rupture, nodes of the wires in between these anchor points above the substrate level are formed. In contrast to the so-called laser dynamic forming (LDF) [12], the shape of the resulting structure is not determined by the shape of a mold, but only by the beam pattern and the material parameters of film and confinement layer. However, in some cases, LDF utilizes a polymer encapsulation of the film to be formed to minimize degradation of the VX-765 price functional film in a similar way to the polymer confinement of this work [13]. Conclusion Silica wire grids with micron- to sub-micron-size periods and nanometer wire diameter are made by patterned laser irradiation of silicon suboxide
films on quartz substrates with polymer top confinement. The specific grid pattern can be varied by tuning fluence and irradiation pattern. The process is based on pulsed laser-induced local softening, forming, and resolidification under AZD6244 chemical structure control of the confinement layer. Various applications in the fields of optics, micro- and nanofluidics, or medical technology (adhesion of cells) are imaginable. References 1. Delmdahl R, Fechner B: Large-area microprocessing with
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